Master thesis - Optimization of Plasma enhanced chemical vapor deposition (PECVD) Thin Films (m/f/d)
普雷姆施泰滕, 施蒂利亚州, 奥地利 – ams-OSRAM AG
职位要求
- Process Analysis and Development:
- Understand the role of PECVD in depositing essential dielectric layers, such as SiO₂ and Si₃N₄ for CMOS devices.
- Investigate the impact of PECVD process parameters (e.g., precursor gas ratios, RF power, pressure, substrate temperature) on film stoichiometry.
- Identify correlations between input parameters and key output metrics like film thickness and RI.
- Experimental Design and Execution:
- Develop systematic experiments using Design of Experiments (DoE) techniques.
- Perform thin film deposition runs on state-of-the-art equipment available at ams-OSRAM's fabrication facilities.
- Metrology and Characterization:
- Characterize deposited thin films using ellipsometry to assess thickness and refractive index and Scanning Electron Microscopy (SEM) with Energy Dispersive X-ray Spectroscopy (EDX) to evaluate stoichiometric composition.
- Evaluate process stability, within-wafer and wafer-to-wafer uniformity.
- Data Analysis and Optimization:
- Analyze experimental data using statistical tools and regression models.
- Propose optimized PECVD recipes that meet stringent CMOS specification targets.
- Derivation of Fit and Response models for process parameter tuning to optimize process capability.
- Reporting and Communication:
- Document all process steps, experimental results, and analysis findings.
- Present progress in regular meetings with supervising engineers and researchers.
- Compile a final thesis report containing conclusions, visualized data, and future recommendations.
联系我们
Marlies Nigitz 将很乐意回答您的任何问题。
电子邮件地址: marlies.nigitz@ams-osram.com
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工作细节
| 发布日期: | 2025/11/11 |
|---|---|
| 经验水平: | 学生 |
| 合同类型: | 学士/硕士论文 |
| 时间安排: | 兼职 |
| 工作模式: | 不可能 |
| 业务单元: | CMOS Sensors & ASICs |
| 组织: | ams-OSRAM AG |
| 工作领域: | 行政&服务 |
| 工作编号: | 21488 |
